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Yoshigoe, Akitaka; Taga, Ryo*; Ogawa, Shuichi*; Takakuwa, Yuji*
no journal, ,
In this conference, the experimental evidence on the existence of molecularly adsorbed oxygen during the oxidation of Si(100)21 surface, which was considered to be absent, is reported. Synchrotron radiation photoelectron spectroscopy measurements was used to reveal its presence during the oxidation at room temperature and -150C.